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CC80MarkIV-0101JY (A/B)




Practical Components CC80MarkIV-0101JY (A/B) advanced test wafer

 

Silicon Interposer for CC80MarkIV-101JY (A/B (IP80-0101JY)

 

Chip Structure

  • Base Layer : P-TEOS
  • Metal Layer : TiN / AI-0.5%Cu
  • Passivation Layer : HDP / P-SiN

*TEOS : Tetraethoxysilane
*HDP : High Density Plasma

 

Specifications
Wafer Size 8 inch
Wafer Thickness 725±25μm
Chip A B
Chip Size 6.0mm x 10.0mm 4.0mm x 10.0mm
Pad Pitch

1. 40μm [10Row] x 50μm[192Row] (Peripheral)
2. 80μm staggered[3Row] (center core)
3. 150μm Min. Lattice

Function Daisy Chian
Electrode/Height Cu15um+SnAgum
Pad Size 1. 30μm
2. 30μm
3. 30μm
Passivation Opening

12μm (Octagon)

Bump Size φ25μm
Number of Bump/Pad 1. 1920 bumps / 1920 pads
2. 687 bumps / 687 pads
3. 1743 bumps / 1743 pads
1. 1920 bumps / 1920 pads
2. 531 bumps / 531 pads
3. 978 bumps / 978 pads
Scribe Width 120μm
Number of Chip Chip A: 228 chips/wafer Chip B: 228 chips/wafer